Nested potassium hydroxide etching and protective coatings for silicon-based microreactors
We have developed a multilayer, multichannel silicon-based microreactor that uses elemental fluorine as a reagent and generates hydrogen fluoride as a byproduct. Nested potassium hydroxide etching (using silicon nitride and silicon oxide as masking materials) was developed to create a large number o...
| Main Authors: | , , |
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| Other Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing,
2015-01-09T19:48:41Z.
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| Subjects: | |
| Online Access: | Get fulltext |