High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

Nanostencil lithography has a number of distinct benefits that make it an attractive nanofabrication processes, but the inability to fabricate features with nanometer precision has significantly limited its utility. In this paper, we describe a nanostencil lithography process that provides sub-15 nm...

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Bibliographic Details
Main Authors: Aernecke, M. (Contributor), Jain, Tarun (Contributor), Liberman, Vladimir (Contributor), Karnik, Rohit (Contributor)
Other Authors: Lincoln Laboratory (Contributor), Massachusetts Institute of Technology. Department of Mechanical Engineering (Contributor)
Format: Article
Language:English
Published: American Institute of Physics (AIP), 2015-10-27T16:09:26Z.
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