High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

• Main Authors: Aernecke, M. (Contributor), Jain, Tarun (Contributor), Liberman, Vladimir (Contributor), Karnik, Rohit (Contributor)
• Other Authors: Lincoln Laboratory (Contributor), Massachusetts Institute of Technology. Department of Mechanical Engineering (Contributor)
• Format: Article
• Language: English
• Published: American Institute of Physics (AIP), 2015-10-27T16:09:26Z.
• Subjects: Article
• Online Access: Get fulltext

Nanostencil lithography has a number of distinct benefits that make it an attractive nanofabrication processes, but the inability to fabricate features with nanometer precision has significantly limited its utility. In this paper, we describe a nanostencil lithography process that provides sub-15 nm resolution even for 40-nm thick structures by using a sacrificial layer to control the proximity between the stencil and substrate, thereby enhancing the correspondence between nanostencil patterns and fabricated nanostructures. We anticipate that controlled proximity nanostencil lithography will provide an environmentally stable, clean, and positive-tone candidate for fabrication of nanostructures with high resolution.
United States. Air Force (Contract FA8721-05-C-0002)