Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2

Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2

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The thermal atomic layer deposition (ALD) of copper oxide films from the non-fluorinated yet liquid precursor bis(tri-<it>n</it>-butylphosphane)copper(I)acetylacetonate, [(<sup><it>n</it></sup>Bu<sub>3</sub>P)<sub>2</sub>Cu(acac)], and...

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Bibliographic Details
Main Authors: Waechtler, Thomas, Oswald, Steffen, Roth, Nina, Jakob, Alexander, Lang, Heinrich, Ecke, Ramona, Schulz, Stefan E., Gessner, Thomas, Moskvinova, Anastasia, Schulze, Steffen, Hietschold, Michael
Format: Article
Language:English
Published: Technische Universität Chemnitz 2009
Subjects:
info:eu-repo/classification/ddc/540
ddc:540
info:eu-repo/classification/ddc/530
ddc:530
info:eu-repo/classification/ddc/620
ddc:620
info:eu-repo/classification/ddc/660
ddc:660
Atomschichtepitaxie
Dampfdruckkurve
Diffusionsbarriere
Diketonate <beta>
Durchstrahlungselektronenmikroskopie
Elektronen-Energieverlustspektroskopie
Elektronenbeugung
Ellipsometrie
Kraftmikroskopie
Kupferkomplexe
Kupferoxide
Metallisieren
Metallisierungsschicht
Phosphane
Rasterelektronenmikroskop
Ruthenium
Röntgen-Photoelektronenspektroskopie
Siliciumdioxid
Tantal
Tantalnitride
ULSI
Atomic Layer Deposition (ALD)
Atomic force microscopy (AFM)
Beta-Diketonate
Copper Oxide
Copper(I)
Damascene
Diffusion Barrier
Electron diffraction
Electron energy loss spectroscopy (EELS)
Interconnect
Metallization
Scanning electron microscopy (SEM)
Silicon Oxide
Spectroscopic ellipsometry
Tantalum
Tantalum Nitride
Transmission electron microscopy (TEM)
Vapor Pressure
X-ray photoelectron spectroscopy (XPS)
Online Access:http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200900734
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http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200900734
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