Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2
The thermal atomic layer deposition (ALD) of copper oxide films from the non-fluorinated yet liquid precursor bis(tri-<it>n</it>-butylphosphane)copper(I)acetylacetonate, [(<sup><it>n</it></sup>Bu<sub>3</sub>P)<sub>2</sub>Cu(acac)], and...
Main Authors: | , , , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Technische Universität Chemnitz
2009
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Subjects: | |
Online Access: | http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200900734 https://monarch.qucosa.de/id/qucosa%3A19121 https://monarch.qucosa.de/api/qucosa%3A19121/attachment/ATT-0/ https://monarch.qucosa.de/api/qucosa%3A19121/attachment/ATT-1/ |