Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2

The thermal atomic layer deposition (ALD) of copper oxide films from the non-fluorinated yet liquid precursor bis(tri-<it>n</it>-butylphosphane)copper(I)acetylacetonate, [(<sup><it>n</it></sup>Bu<sub>3</sub>P)<sub>2</sub>Cu(acac)], and...

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Bibliographic Details
Main Authors: Waechtler, Thomas, Oswald, Steffen, Roth, Nina, Jakob, Alexander, Lang, Heinrich, Ecke, Ramona, Schulz, Stefan E., Gessner, Thomas, Moskvinova, Anastasia, Schulze, Steffen, Hietschold, Michael
Format: Article
Language:English
Published: Technische Universität Chemnitz 2009
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Online Access:http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200900734
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