Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2
The thermal atomic layer deposition (ALD) of copper oxide films from the non-fluorinated yet liquid precursor bis(tri-<it>n</it>-butylphosphane)copper(I)acetylacetonate, [(<sup><it>n</it></sup>Bu<sub>3</sub>P)<sub>2</sub>Cu(acac)], and...
Main Authors: | , , , , , , , , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
Universitätsbibliothek Chemnitz
2009
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Subjects: | |
Online Access: | http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200900734 http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200900734 http://www.qucosa.de/fileadmin/data/qucosa/documents/5795/data/JES_Postprint.pdf http://www.qucosa.de/fileadmin/data/qucosa/documents/5795/20090073.txt |