Copper Oxide ALD from a Cu(I) <beta>-Diketonate: Detailed Growth Studies on SiO2 and TaN
The atomic layer deposition (ALD) of copper oxide films from [(<sup>n</sup>Bu<sub>3</sub>P)<sub>2</sub>Cu(acac)] and wet oxygen on SiO<sub>2</sub> and TaN has been studied in detail by spectroscopic ellipsometry and atomic force microscopy. The re...
Main Authors: | , , , , , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
Universitätsbibliothek Chemnitz
2009
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Online Access: | http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200901741 http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200901741 http://www.qucosa.de/fileadmin/data/qucosa/documents/5896/data/Waechtler_ECS2009.pdf http://www.qucosa.de/fileadmin/data/qucosa/documents/5896/20090174.txt |