Copper Oxide ALD from a Cu(I) <beta>-Diketonate: Detailed Growth Studies on SiO2 and TaN

Copper Oxide ALD from a Cu(I) <beta>-Diketonate: Detailed Growth Studies on SiO2 and TaN

Show other versions (1)

The atomic layer deposition (ALD) of copper oxide films from [(<sup>n</sup>Bu<sub>3</sub>P)<sub>2</sub>Cu(acac)] and wet oxygen on SiO<sub>2</sub> and TaN has been studied in detail by spectroscopic ellipsometry and atomic force microscopy. The re...

Full description

Bibliographic Details
Main Authors:	Waechtler, Thomas, Roth, Nina, Mothes, Robert, Schulze, Steffen, Schulz, Stefan E., Gessner, Thomas, Lang, Heinrich, Hietschold, Michael
Other Authors:	TU Chemnitz, Fakultät für Naturwissenschaften
Format:	Article
Language:	English
Published:	Universitätsbibliothek Chemnitz 2009
Subjects:	Atomic Layer Deposition (ALD) Copper oxide Kupfer(I) ddc:620 ddc:660 ddc:530 Atomschichtepitaxie Ausgangsmaterial Beschichten Diketonate <beta> Durchstrahlungselektronenmikroskopie Dünne Schicht Ellipsometrie Kraftmikroskopie Kupferkomplexe Kupferoxide Nanopartikel Nanotechnologie Schichtwachstum Siliciumdioxid Tantalnitride
Online Access:	http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200901741 http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200901741 http://www.qucosa.de/fileadmin/data/qucosa/documents/5896/data/Waechtler_ECS2009.pdf http://www.qucosa.de/fileadmin/data/qucosa/documents/5896/20090174.txt

Internet

http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200901741
http://nbn-resolving.de/urn:nbn:de:bsz:ch1-200901741
http://www.qucosa.de/fileadmin/data/qucosa/documents/5896/data/Waechtler_ECS2009.pdf
http://www.qucosa.de/fileadmin/data/qucosa/documents/5896/20090174.txt