Herstellung, Charakterisierung und Bewertung leitfähiger Diffusionsbarrieren auf Basis von Tantal, Titan und Wolfram für die Kupfermetallisierung von Siliciumschaltkreisen
The thesis investigates the potential of thin films of Ta, Ti and W and their nitrides to suppress copper induced interactions in the contact area to silicon. Possible interactions between Cu and gaseos or solid materials within preparation and lifetime of an integrated circuit are summarized. The...
Main Author: | |
---|---|
Other Authors: | |
Format: | Doctoral Thesis |
Language: | deu |
Published: |
Universitätsbibliothek Chemnitz
2004
|
Subjects: | |
Online Access: | http://nbn-resolving.de/urn:nbn:de:swb:ch1-200400726 http://nbn-resolving.de/urn:nbn:de:swb:ch1-200400726 http://www.qucosa.de/fileadmin/data/qucosa/documents/4828/data/diss.pdf http://www.qucosa.de/fileadmin/data/qucosa/documents/4828/20040072.txt |