Development and advanced characterization of novel chemically amplified resists for next generation lithography
The microelectronics industry has made remarkable progress with the development of integrated circuit (IC) technology which depends on the advance of micro-fabrication and integration techniques. On one hand, next-generation lithography (NGL) technologies which utilize extreme ultraviolet (EUV) and...
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Georgia Institute of Technology
2010
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| Online Access: | http://hdl.handle.net/1853/31758 |