Molecular resists for advanced lithography - design, synthesis, characterization, and simulation
Many problems exist in current photoresist designs that will limit their ability to obtain the performance required for future generations of integrated circuit devices. In order to overcome these challenges, novel resist designs are required, along with advancement in the fundamental understanding...
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Georgia Institute of Technology
2011
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| Online Access: | http://hdl.handle.net/1853/39601 |