Optimization of ALD grown titania thin films for the infiltration of silica photonic crystals
The atomic layer deposition (ALD) growth of titania thin films was studied for the infiltration of silica photonic crystals. Titania thin films were grown in a custom-built ALD reactor by the alternating pulsing and purging of TiCl4 and water vapor. The conformal nature of ALD growth makes it an i...
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| Format: | Others |
| Language: | en_US |
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Georgia Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1853/4986 |