Surface Monolayer Initiated Polymerization: A Novel Means of Fabricating Sub - 100 nm Features
The speed of microelectronic devices is controlled by the size of the transistor gate. In order to create faster devices, the size of this transistor gate must shrink. Microlithography is the method used to define patterns in semiconductor devices, and it is optimized periodically to create smaller...
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| Format: | Others |
| Language: | en_US |
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Georgia Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1853/5232 |