Spectral radiative properties of thin films with rough surfaces using Fourier-transform infrared spectrometry

Thin films are used in many energy conversion applications, ranging from photodetectors to solar cells. Accurately predicting the radiative properties of thin films when they possess rough surfaces is critical in many instances, but can be challenging due to the complexity arising from light scatter...

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Main Author: Khuu, Vinh
Format: Others
Language:en_US
Published: Georgia Institute of Technology 2005
Subjects:
Online Access:http://hdl.handle.net/1853/5263
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spelling ndltd-GATECH-oai-smartech.gatech.edu-1853-52632013-01-07T20:11:17ZSpectral radiative properties of thin films with rough surfaces using Fourier-transform infrared spectrometryKhuu, VinhFT-IRFourier transform infrared spectrometryRadiative propertiesThin filmsThin films are used in many energy conversion applications, ranging from photodetectors to solar cells. Accurately predicting the radiative properties of thin films when they possess rough surfaces is critical in many instances, but can be challenging due to the complexity arising from light scattering and interferences at the microscale. This work describes measurements of the spectral transmittance and reflectance of several thin-film materials (including crystalline silicon wafers and a polycrystalline diamond film) in the mid-infrared spectral region (2 20 m) using a Fourier-transform infrared (FT-IR) spectrometer. The transmittance and reflectance were calculated using thin-film optics for the double-side polished samples and scalar scattering theory for the single-side polished samples. The effects of partial coherence are considered using a fringe smoothing technique. The interval used for fringe smoothing was assumed to be linearly dependent on the wavenumber. Good agreement between the predicted and measured transmittance was achieved for the double-side polished silicon wafers and for the diamond film. The disagreement for some single-side polished silicon wafers may be inherently related to their surface microstructures, as suggested from surface topographic data and images obtained from surface profilometry and microscopy. By comparing the intervals used for fringe smoothing with the instrumental resolution, beam divergence in the spectrometer was found to be a major factor contributing to the partial coherence. Future research is proposed to investigate the correlation between the detailed surface characteristics and the conical-conical transmittance and reflectance.Georgia Institute of Technology2005-03-04T15:19:10Z2005-03-04T15:19:10Z2004-04-12Thesis1407996 bytesapplication/pdfhttp://hdl.handle.net/1853/5263en_US
collection NDLTD
language en_US
format Others
sources NDLTD
topic FT-IR
Fourier transform infrared spectrometry
Radiative properties
Thin films
spellingShingle FT-IR
Fourier transform infrared spectrometry
Radiative properties
Thin films
Khuu, Vinh
Spectral radiative properties of thin films with rough surfaces using Fourier-transform infrared spectrometry
description Thin films are used in many energy conversion applications, ranging from photodetectors to solar cells. Accurately predicting the radiative properties of thin films when they possess rough surfaces is critical in many instances, but can be challenging due to the complexity arising from light scattering and interferences at the microscale. This work describes measurements of the spectral transmittance and reflectance of several thin-film materials (including crystalline silicon wafers and a polycrystalline diamond film) in the mid-infrared spectral region (2 20 m) using a Fourier-transform infrared (FT-IR) spectrometer. The transmittance and reflectance were calculated using thin-film optics for the double-side polished samples and scalar scattering theory for the single-side polished samples. The effects of partial coherence are considered using a fringe smoothing technique. The interval used for fringe smoothing was assumed to be linearly dependent on the wavenumber. Good agreement between the predicted and measured transmittance was achieved for the double-side polished silicon wafers and for the diamond film. The disagreement for some single-side polished silicon wafers may be inherently related to their surface microstructures, as suggested from surface topographic data and images obtained from surface profilometry and microscopy. By comparing the intervals used for fringe smoothing with the instrumental resolution, beam divergence in the spectrometer was found to be a major factor contributing to the partial coherence. Future research is proposed to investigate the correlation between the detailed surface characteristics and the conical-conical transmittance and reflectance.
author Khuu, Vinh
author_facet Khuu, Vinh
author_sort Khuu, Vinh
title Spectral radiative properties of thin films with rough surfaces using Fourier-transform infrared spectrometry
title_short Spectral radiative properties of thin films with rough surfaces using Fourier-transform infrared spectrometry
title_full Spectral radiative properties of thin films with rough surfaces using Fourier-transform infrared spectrometry
title_fullStr Spectral radiative properties of thin films with rough surfaces using Fourier-transform infrared spectrometry
title_full_unstemmed Spectral radiative properties of thin films with rough surfaces using Fourier-transform infrared spectrometry
title_sort spectral radiative properties of thin films with rough surfaces using fourier-transform infrared spectrometry
publisher Georgia Institute of Technology
publishDate 2005
url http://hdl.handle.net/1853/5263
work_keys_str_mv AT khuuvinh spectralradiativepropertiesofthinfilmswithroughsurfacesusingfouriertransforminfraredspectrometry
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