Skip to content
Open Access
  • Home
  • Collections
    • High Impact Articles
    • Jawi Collection
    • Malay Medicine
    • Forensic
  • Search Options
    • UiTM Open Access
    • Search by UiTM Scopus
    • Advanced Search
    • Search by Category
  • Discovery Service
    • Sources
    • UiTM Journals
    • List UiTM Journal in IR
    • Statistic
  • About
    • Open Access
    • Creative Commons Licenses
    • COKI | Malaysia Open Access
    • User Guide
    • Contact Us
    • Search Tips
    • FAQs
Advanced
  • Chemical vapor deposition and...
  • Cite this
  • Text this
  • Email this
  • Print
  • Export Record
    • Export to RefWorks
    • Export to EndNoteWeb
    • Export to EndNote
  • Permanent link
Chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications

Chemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applications

Bibliographic Details
Main Author: Mays, Ebony Lynn
Format: Others
Language:en_US
Published: Georgia Institute of Technology 2005
Subjects:
Zirconium alloys Analysis
Thin films
Chemical vapor deposition
Dielectrics
Online Access:http://hdl.handle.net/1853/5422
  • Holdings
  • Description
  • Similar Items
  • Staff View

Internet

http://hdl.handle.net/1853/5422

Similar Items

  • Novel Low Dielectric Constant Thin Film Materials by Chemical Vapor Deposition
    by: Simkovic, Viktor
    Published: (2014)
  • Deposition of epitaxial Si/Si-Ge/Ge and novel high-K gate dielectrics using remote plasma chemical vapor deposition
    by: Chen, Xiao, 1972-
    Published: (2011)
  • Chemical Vapor Deposition of Hafnium Oxynitride Films Using Different Oxidants
    by: Luo, Qian
    Published: (2006)
  • Direct liquid injection chemical vapor deposition of ZrO2 films from a heteroleptic Zr precursor: interplay between film characteristics and corrosion protection of stainless steel
    by: Sebastian M.J. Beer, et al.
    Published: (2021-07-01)
  • Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x
    by: Goswami, Jaydeb
    Published: (2013)

© 2020 | Services hosted by the Perpustakaan Tun Abdul Razak, | Universiti Teknologi MARA | Disclaimer


Loading...
Cannot write session to /tmp/vufind_sessions/sess_en8macjoi4b2tbsgicto4u3bl6