Pulsed Laser Deposition of Hydroxyapatite Thin Films
Pulsed laser deposition (PLD) was used to deposit hydroxyapatite (HA) thin films on various substrates, including silicon (100) and titanium (Ti-6Al-4V) alloy. Thin films of amorphous HA were deposited at room temperature and then annealed over a range of temperatures. The microstructure and composi...
| Main Author: | |
|---|---|
| Format: | Others |
| Language: | en_US |
| Published: |
Georgia Institute of Technology
2005
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1853/6839 |