Filmes finos de óxidos de vanádio depositados por sputtering reativo
Coordenação de Aperfeiçoamento de Pessoal de Nível Superior === We have produced thin film samples of vanadium oxide, with different stoichiometry, by reactive magnetron sputtering from a metallic vanadium target. The thickness of the samples were maintained under 100 nm and glass or silicon wafers,...
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| Format: | Others |
| Language: | Portuguese |
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Universidade Federal de Santa Maria
2017
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| Online Access: | http://repositorio.ufsm.br/handle/1/9176 |