Efeito da pressão em filmes finos de ZnO:Al por RF Magnetron sputtering reativo

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Bibliographic Details
Main Author: Chaves, Michel [UNESP]
Other Authors: Universidade Estadual Paulista (UNESP)
Format: Others
Language:Portuguese
Published: Universidade Estadual Paulista (UNESP) 2015
Subjects:
Online Access:http://hdl.handle.net/11449/115609