Efeito da pressão em filmes finos de ZnO:Al por RF Magnetron sputtering reativo
Made available in DSpace on 2015-03-03T11:52:23Z (GMT). No. of bitstreams: 0 Previous issue date: 2014-07-16Bitstream added on 2015-03-03T12:07:24Z : No. of bitstreams: 1 000806683.pdf: 1193891 bytes, checksum: 1226deee936f356b44515bf10a7e5739 (MD5) === Conselho Nacional de Desenvolvimento Científ...
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Format: | Others |
Language: | Portuguese |
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Universidade Estadual Paulista (UNESP)
2015
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Online Access: | http://hdl.handle.net/11449/115609 |