High-k Dielectrics For Metal-Insulator-Metal Capacitors

High-k Dielectrics For Metal-Insulator-Metal Capacitors

Metal-insulator-metal (MIM) capacitors are used for analog, RF, and DRAM applications in ICs. The International Technology Roadmap for Semiconductors (ITRS) specifies continuing increase in capacitance density (> 7 fF/ m2), lower leakage current density (< 10 8 A/cm2), very low effective oxide...

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Bibliographic Details
Main Author: Revathy, P
Other Authors: Bhat, Navakanta
Language:en_US
Published: 2016
Subjects:
Dielectrics
Metal-Insulator-Metal (MIM) Capacitors
High-k Dielectrics
Europium Oxide Metal-Insulator-Metal Capacitors
Gadolinium Oxide Metal-Insulator-Metal Capacitors
Multi-Dielectric Stack Devices
Doped-Dielectric Stack Devices
Metal-Insulator-Metal Capacitors
Gadolinium Oxide-Europium Oxide Stacked Capacitors
Titanium Oxide-Zirconium Oxide Stacked Capacitors
Europium Oxide (Eu2O3) MIM Capacitors
Gadolinium Oxide (Gd2O3) MIM Capacitors
Titanium Oxide (TiO2)
Voltage Coefficient of Capacitance (VCC)
Zirconium Oxide (ZrO2)
High-k Materials
Electrical Engineering
Online Access:http://etd.iisc.ernet.in/handle/2005/2597
http://etd.ncsi.iisc.ernet.in/abstracts/3366/G25994-Abs.pdf

Internet

http://etd.iisc.ernet.in/handle/2005/2597
http://etd.ncsi.iisc.ernet.in/abstracts/3366/G25994-Abs.pdf

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