Investigation of the properties of plasma enhanced CVD silicon dioxide and its applications to VLSI technology

Investigation of the properties of plasma enhanced CVD silicon dioxide and its applications to VLSI technology

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Bibliographic Details
Main Author: Li, Yong Qiang
Published: 2013
Online Access:http://hdl.handle.net/1993/16891

Internet

http://hdl.handle.net/1993/16891

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