Deep etching of silicon with xenon difluoride
Fabrication of microelectromechanical systems (MEMS) requires systems for depositing and selectively removing of parts of a substrate material. The most commonly used material in micromachining of different MEMS devices is silicon. Therefore, depositing and etching of silicon is of great importance...
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| Language: | en_US |
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2007
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| Online Access: | http://hdl.handle.net/1993/2099 |