Deep etching of silicon with xenon difluoride

Deep etching of silicon with xenon difluoride

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Fabrication of microelectromechanical systems (MEMS) requires systems for depositing and selectively removing of parts of a substrate material. The most commonly used material in micromachining of different MEMS devices is silicon. Therefore, depositing and etching of silicon is of great importance...

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Bibliographic Details
Main Author:	Bahreyni, Behraad
Language:	en_US
Published:	2007
Online Access:	http://hdl.handle.net/1993/2099

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