Ultra-Violet Lithography of Thick Photoresist for the Applications in BioMEMS and Micro Optics

UV lithography of thick photoresist is widely used in microelectromechanical systems (MEMS) and micro-optoelectromechanical systems (MOEMS). SU-8 is a typical negative tone thick photoresist for micro systems, and can be used for both structural material and pattern transfer. This dissertation pres...

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Bibliographic Details
Main Author: Yang, Ren
Other Authors: Wanjun Wang
Format: Others
Language:en
Published: LSU 2006
Subjects:
Online Access:http://etd.lsu.edu/docs/available/etd-07122006-235055/