Ultra-Violet Lithography of Thick Photoresist for the Applications in BioMEMS and Micro Optics
UV lithography of thick photoresist is widely used in microelectromechanical systems (MEMS) and micro-optoelectromechanical systems (MOEMS). SU-8 is a typical negative tone thick photoresist for micro systems, and can be used for both structural material and pattern transfer. This dissertation pres...
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| Format: | Others |
| Language: | en |
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LSU
2006
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| Online Access: | http://etd.lsu.edu/docs/available/etd-07122006-235055/ |