A Novel Template Stage with Superior Alignment Capability for Nanoimprint and Step and Flash Lithography
The high-resolution capabilities of imprinting and step and flash lithography make these techniques strong contenders for the next generation lithography. Unfortunately, alignment remains an area of concern for nanoimprint because it must be completed before the template is moved into contact with t...
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| Format: | Others |
| Language: | en |
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LSU
2007
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| Online Access: | http://etd.lsu.edu/docs/available/etd-10312007-094056/ |