In-situ depth monitoring for a deep reactive ion etcher using a white light interferometer with active vibration cancellation
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2019 === Cataloged from PDF version of thesis. === Includes bibliographical references (pages 119-121). === Standard process development for micro and nanofabrication etching technologie...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2019
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| Online Access: | https://hdl.handle.net/1721.1/121726 |