Chemical vapor deposition of fluorocarbon films for low dielectric constant thin film applications
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2000. === Includes bibliographical references. === This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections. === Pulsed plasm...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/16748 |