Towards in-situ device fabrication : electrostatic lithography and nanowire field effect devices
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2005. === Includes bibliographical references (leaves 79-80). === Electron beams were used to deposit fine line-width charge in electret materials. The electrets were exposed to charged or polarizable n...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2006
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| Online Access: | http://hdl.handle.net/1721.1/30264 |