Chemical vapor deposition of organosilicon and sacrificial polymer thin films

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2005. === Includes bibliographical references. === Chemical vapor deposition (CVD) produced films for a wide array of applications from a variety of organosilicon and organic precursors. The structure and properti...

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Bibliographic Details
Main Author: Casserly, Thomas Bryan
Other Authors: Karen K. Gleason.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2006
Subjects:
Online Access:http://hdl.handle.net/1721.1/32329