Initiated chemical vapor deposition of polymeric thin films : mechanism and applications

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2005. === Includes bibliographical references. === Initiated chemical vapor deposition (iCVD) is a novel technique for depositing polymeric thin films. It is able to deposit thin films of application-specific poly...

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Bibliographic Details
Main Author: Chan, Kelvin, Ph. D. Massachusetts Institute of Technology
Other Authors: Karen K. Gleason.
Format: Others
Published: Massachusetts Institute of Technology 2006
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