Toward nano-accuracy in scanning beam interference lithography

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2006. === Includes bibliographical references (p. 213-217). === Scanning beam interference lithography is a technique developed in our laboratory which uses interfering beams and a scanning...

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Bibliographic Details
Main Author: Montoya, Juan, 1976-
Other Authors: Mark Schattenburg.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2007
Subjects:
Online Access:http://hdl.handle.net/1721.1/37909