Temperature-dependent yield properties of passivated aluminum thin films on silicon wafers

Temperature-dependent yield properties of passivated aluminum thin films on silicon wafers

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996. === Includes bibliographical references (p. 89-94). === by Edison C. Chu. === M.S.

Bibliographic Details
Main Author: Chu, Edison C. (Edison Chinghing)
Other Authors: Subra Suresh.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2008
Subjects:
Materials Science and Engineering
Online Access:http://hdl.handle.net/1721.1/41414

Internet

http://hdl.handle.net/1721.1/41414

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