Variation reduction in plasma etching via run-to-run process control and endpoint detection

Variation reduction in plasma etching via run-to-run process control and endpoint detection

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997. === Includes bibliographical references (leaves 89-91). === by Minh Sy Le. === M.S.

Bibliographic Details
Main Author: Le, Minh Sy
Other Authors: Herbert H. Sawin.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2008
Subjects:
Electrical Engineering and Computer Science
Online Access:http://hdl.handle.net/1721.1/43565

Internet

http://hdl.handle.net/1721.1/43565

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