Overcoming the far-field diffraction limit via absorbance modulation

Overcoming the far-field diffraction limit via absorbance modulation

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011. === Cataloged from PDF version of thesis. === Includes bibliographical references (p. 241-251). === Diffraction limits the resolution of far-field lithography and imaging to about half...

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Bibliographic Details
Main Author: Tsai, Hsin-Yu Sidney
Other Authors: Henry I. Smith.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2011
Subjects:
Electrical Engineering and Computer Science.
Online Access:http://hdl.handle.net/1721.1/66464

Internet

http://hdl.handle.net/1721.1/66464

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