Complementary computational chemistry and surface science experiments of reaction pathways in aluminum chemical vapor deposition
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999. === Includes bibliographical references. === Continued advances in the semiconductor industry will require the introduction of new materials and processes concurrent with shrinking device dimensions. These s...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/8180 |