Multivariate endpoint detection of plasma etching processes
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2002. === Includes bibliographical references. === In plasma etching process it is critical to know when the film being etched has cleared to the underlying film, i.e. to detect endpoint, in order to achieve the de...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | English |
| Published: |
Massachusetts Institute of Technology
2005
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1721.1/8498 |