Alternative passivation for silicon (100), environmentally benign manufacturing, and cooperative strategy in semiconductor industry

Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering; and, (S.M.)--Massachusetts Institute of Technology, Technology and Policy Program, 2000. === Includes bibliographical references (p. 118-120). === My personal involvement, as a research graduate student...

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Main Author: Chan, Julia Kam Chu, 1972-
Other Authors: Lionel C. Kimerling and Robert Rose.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2005
Subjects:
Online Access:http://hdl.handle.net/1721.1/8850
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spelling ndltd-MIT-oai-dspace.mit.edu-1721.1-88502019-05-02T16:02:16Z Alternative passivation for silicon (100), environmentally benign manufacturing, and cooperative strategy in semiconductor industry Chan, Julia Kam Chu, 1972- Lionel C. Kimerling and Robert Rose. Massachusetts Institute of Technology. Technology and Policy Program. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Massachusetts Institute of Technology. Technology and Policy Program. Materials Science and Engineering. Technology and Policy Program. Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering; and, (S.M.)--Massachusetts Institute of Technology, Technology and Policy Program, 2000. Includes bibliographical references (p. 118-120). My personal involvement, as a research graduate student, sponsored by Engineering Research Center, a center created by National Science Foundation and Semiconductor Research Corporation demonstrates that, through industrial research staffs' mentoring, university research can bring innovative environmentally benign manufacturing methods to the U.S. semiconductor industry. Our group has used methoxy to protect the bare silicon surface, because we have identified that the industrial standard, hydrogen passivation of silicon (H-Si) degrades rapidly when exposes to air. In this thesis, two new processing steps are added to make this methoxy passivation compatible to industrial practice. In addition, a preliminary gate oxide test demonstrated that this methoxy terminated silicon (MeO-Si) yielded a thinner ultra thin gate oxide than those wafers cleaned by IBM's conventional RCA and dilute hydrofluoric acid last clean without compromising its reliability. Furthermore, particle count results shown that this MeO-Si has the same particle resistance as H-Si. Further mechanistic and thermodynamic studies are performed such that this process is optimized. As a result, MeO-Si is 49 times more stable than H-Si against air degradation. Through this center, an Environmental Safety and Health incorporated Cost of Ownership is developed in this thesis. This is done by using in vitro studies to evaluate the toxicity of new chemicals used, and by using lifecycle analysis to calculate the amount of untreated chemical, which leaks to the environment. Both of these will give rise to an environmental figure of merit to modify the conventional cost of ownership. In the last section, a strategic analysis of this Engineering Research Center is performed to demonstrated that students are a very important media to (1) facilitating technology transfer to industry, (2) enhancing collaboration along the chain of semiconductor industrial participants. by Julia Kam Chu Chan. S.M. 2005-08-23T15:49:44Z 2005-08-23T15:49:44Z 2000 2000 Thesis http://hdl.handle.net/1721.1/8850 48591151 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 120 p. 7458498 bytes 7458256 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology
collection NDLTD
language English
format Others
sources NDLTD
topic Materials Science and Engineering.
Technology and Policy Program.
spellingShingle Materials Science and Engineering.
Technology and Policy Program.
Chan, Julia Kam Chu, 1972-
Alternative passivation for silicon (100), environmentally benign manufacturing, and cooperative strategy in semiconductor industry
description Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering; and, (S.M.)--Massachusetts Institute of Technology, Technology and Policy Program, 2000. === Includes bibliographical references (p. 118-120). === My personal involvement, as a research graduate student, sponsored by Engineering Research Center, a center created by National Science Foundation and Semiconductor Research Corporation demonstrates that, through industrial research staffs' mentoring, university research can bring innovative environmentally benign manufacturing methods to the U.S. semiconductor industry. Our group has used methoxy to protect the bare silicon surface, because we have identified that the industrial standard, hydrogen passivation of silicon (H-Si) degrades rapidly when exposes to air. In this thesis, two new processing steps are added to make this methoxy passivation compatible to industrial practice. In addition, a preliminary gate oxide test demonstrated that this methoxy terminated silicon (MeO-Si) yielded a thinner ultra thin gate oxide than those wafers cleaned by IBM's conventional RCA and dilute hydrofluoric acid last clean without compromising its reliability. Furthermore, particle count results shown that this MeO-Si has the same particle resistance as H-Si. Further mechanistic and thermodynamic studies are performed such that this process is optimized. As a result, MeO-Si is 49 times more stable than H-Si against air degradation. Through this center, an Environmental Safety and Health incorporated Cost of Ownership is developed in this thesis. This is done by using in vitro studies to evaluate the toxicity of new chemicals used, and by using lifecycle analysis to calculate the amount of untreated chemical, which leaks to the environment. Both of these will give rise to an environmental figure of merit to modify the conventional cost of ownership. In the last section, a strategic analysis of this Engineering Research Center is performed to demonstrated that students are a very important media to (1) facilitating technology transfer to industry, (2) enhancing collaboration along the chain of semiconductor industrial participants. === by Julia Kam Chu Chan. === S.M.
author2 Lionel C. Kimerling and Robert Rose.
author_facet Lionel C. Kimerling and Robert Rose.
Chan, Julia Kam Chu, 1972-
author Chan, Julia Kam Chu, 1972-
author_sort Chan, Julia Kam Chu, 1972-
title Alternative passivation for silicon (100), environmentally benign manufacturing, and cooperative strategy in semiconductor industry
title_short Alternative passivation for silicon (100), environmentally benign manufacturing, and cooperative strategy in semiconductor industry
title_full Alternative passivation for silicon (100), environmentally benign manufacturing, and cooperative strategy in semiconductor industry
title_fullStr Alternative passivation for silicon (100), environmentally benign manufacturing, and cooperative strategy in semiconductor industry
title_full_unstemmed Alternative passivation for silicon (100), environmentally benign manufacturing, and cooperative strategy in semiconductor industry
title_sort alternative passivation for silicon (100), environmentally benign manufacturing, and cooperative strategy in semiconductor industry
publisher Massachusetts Institute of Technology
publishDate 2005
url http://hdl.handle.net/1721.1/8850
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