Nanometer-scale placement in electron-beam lithography
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2000. === Includes bibliographical references (p. 259-268). === Electron-beam lithography is capable of high-resolution lithographic pattern generation (down to 10 nm or below). However, for...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/9117 |