Atomic layer deposition of nanolaminate Al₂O₃-Ta₂O₅ and ZnO-SnO₂ films
Thin films are an enabling technology for a wide range of applications, from microprocessors to diffusion barriers. Nanolaminate thin films combine two (or more) materials in a layered structure to achieve performance that neither film could provide on its own. Atomic layer deposition (ALD) is a che...
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| Language: | en_US |
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2011
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| Online Access: | http://hdl.handle.net/1957/20687 |