Fabrication, characterisation and modelling of nanocrystalline silicon thin-film transistors obtained by hot-wire chemical vapour deposition.
Hot-wire chemical vapour deposition (HWCVD) is a promising technique that permits polycrystalline silicon films with grain size of nanometers to be obtained at high deposition rates and low substrate temperatures. This material is expected to have better electronic properties than the commonly used...
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| Format: | Doctoral Thesis |
| Language: | English |
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Universitat Politècnica de Catalunya
2003
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| Online Access: | http://hdl.handle.net/10803/6324 http://nbn-resolving.de/urn:isbn:8468821926 |