Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD

碩士 === 國立成功大學 === 電機工程研究所 === 74 ===

Bibliographic Details
Main Authors: LIU, WAN-RONG, 劉萬榮
Other Authors: FANG, YAN-KUN
Format: Others
Language:zh-TW
Published: 1986
Online Access:http://ndltd.ncl.edu.tw/handle/88077167180350178058