Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD

碩士 === 國立成功大學 === 電機工程研究所 === 74 ===

Bibliographic Details
Main Authors: LIU, WAN-RONG, 劉萬榮
Other Authors: FANG, YAN-KUN
Format: Others
Language:zh-TW
Published: 1986
Online Access:http://ndltd.ncl.edu.tw/handle/88077167180350178058
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spelling ndltd-TW-074NCKU24420242015-10-13T12:37:08Z http://ndltd.ncl.edu.tw/handle/88077167180350178058 Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD 光激化學氣相沈積法成長氮化矽與氧化矽薄膜之研究 LIU, WAN-RONG 劉萬榮 碩士 國立成功大學 電機工程研究所 74 FANG, YAN-KUN ZHANG, JUN-YAN 方炎坤 張俊彥 1986 學位論文 ; thesis 0 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立成功大學 === 電機工程研究所 === 74 ===
author2 FANG, YAN-KUN
author_facet FANG, YAN-KUN
LIU, WAN-RONG
劉萬榮
author LIU, WAN-RONG
劉萬榮
spellingShingle LIU, WAN-RONG
劉萬榮
Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD
author_sort LIU, WAN-RONG
title Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD
title_short Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD
title_full Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD
title_fullStr Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD
title_full_unstemmed Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD
title_sort growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-cvd
publishDate 1986
url http://ndltd.ncl.edu.tw/handle/88077167180350178058
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