Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD
碩士 === 國立成功大學 === 電機工程研究所 === 74 ===
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ndltd-TW-074NCKU24420242015-10-13T12:37:08Z http://ndltd.ncl.edu.tw/handle/88077167180350178058 Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD 光激化學氣相沈積法成長氮化矽與氧化矽薄膜之研究 LIU, WAN-RONG 劉萬榮 碩士 國立成功大學 電機工程研究所 74 FANG, YAN-KUN ZHANG, JUN-YAN 方炎坤 張俊彥 1986 學位論文 ; thesis 0 zh-TW |
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zh-TW |
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Others
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碩士 === 國立成功大學 === 電機工程研究所 === 74 ===
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author2 |
FANG, YAN-KUN |
author_facet |
FANG, YAN-KUN LIU, WAN-RONG 劉萬榮 |
author |
LIU, WAN-RONG 劉萬榮 |
spellingShingle |
LIU, WAN-RONG 劉萬榮 Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD |
author_sort |
LIU, WAN-RONG |
title |
Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD |
title_short |
Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD |
title_full |
Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD |
title_fullStr |
Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD |
title_full_unstemmed |
Growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-CVD |
title_sort |
growth and characterization of silicon nitride and silicon dioxide films prepared by phofo-cvd |
publishDate |
1986 |
url |
http://ndltd.ncl.edu.tw/handle/88077167180350178058 |
work_keys_str_mv |
AT liuwanrong growthandcharacterizationofsiliconnitrideandsilicondioxidefilmspreparedbyphofocvd AT liúwànróng growthandcharacterizationofsiliconnitrideandsilicondioxidefilmspreparedbyphofocvd AT liuwanrong guāngjīhuàxuéqìxiāngchénjīfǎchéngzhǎngdànhuàxìyǔyǎnghuàxìbáomózhīyánjiū AT liúwànróng guāngjīhuàxuéqìxiāngchénjīfǎchéngzhǎngdànhuàxìyǔyǎnghuàxìbáomózhīyánjiū |
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