Study of dielectric film and interfacial properties of plasma-enhanced chemical vapour deposited (PECVD) silicon oxy-nitride (SiOxNy) on III-V compound semiconductors (GaAs and InP)
博士 === 國立清華大學 === 電機工程研究所 === 75 ===
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1987
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/66558497851898167120 |