Recrystallization of PECVD amorphous silicon films on SiO2 substrates

碩士 === 國立交通大學 === 電子研究所 === 78 ===

Bibliographic Details
Main Authors: ZHANG,RUI-DA, 張睿達
Other Authors: ZHENG,HUANG-ZHONG
Format: Others
Language:zh-TW
Published: 1990
Online Access:http://ndltd.ncl.edu.tw/handle/58504932574235698311