Recrystallization of PECVD amorphous silicon films on SiO2 substrates

碩士 === 國立交通大學 === 電子研究所 === 78 ===

Bibliographic Details
Main Authors:	ZHANG,RUI-DA, 張睿達
Other Authors:	ZHENG,HUANG-ZHONG
Format:	Others
Language:	zh-TW
Published:	1990
Online Access:	http://ndltd.ncl.edu.tw/handle/58504932574235698311

id	ndltd-TW-078NCTU2430074
record_format	oai_dc
spelling	ndltd-TW-078NCTU24300742015-10-13T15:21:05Z http://ndltd.ncl.edu.tw/handle/58504932574235698311 Recrystallization of PECVD amorphous silicon films on SiO2 substrates 電漿輔助化學氣相蒸鍍非晶矽之再結晶 ZHANG,RUI-DA 張睿達碩士國立交通大學電子研究所 78 ZHENG,HUANG-ZHONG WU,QING-YUAN 鄭晃忠吳慶源 1990 學位論文 ; thesis 23 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 國立交通大學 === 電子研究所 === 78 ===
author2	ZHENG,HUANG-ZHONG
author_facet	ZHENG,HUANG-ZHONG ZHANG,RUI-DA 張睿達
author	ZHANG,RUI-DA 張睿達
spellingShingle	ZHANG,RUI-DA 張睿達 Recrystallization of PECVD amorphous silicon films on SiO2 substrates
author_sort	ZHANG,RUI-DA
title	Recrystallization of PECVD amorphous silicon films on SiO2 substrates
title_short	Recrystallization of PECVD amorphous silicon films on SiO2 substrates
title_full	Recrystallization of PECVD amorphous silicon films on SiO2 substrates
title_fullStr	Recrystallization of PECVD amorphous silicon films on SiO2 substrates
title_full_unstemmed	Recrystallization of PECVD amorphous silicon films on SiO2 substrates
title_sort	recrystallization of pecvd amorphous silicon films on sio2 substrates
publishDate	1990
url	http://ndltd.ncl.edu.tw/handle/58504932574235698311
work_keys_str_mv	AT zhangruida recrystallizationofpecvdamorphoussiliconfilmsonsio2substrates AT zhāngruìdá recrystallizationofpecvdamorphoussiliconfilmsonsio2substrates AT zhangruida diànjiāngfǔzhùhuàxuéqìxiāngzhēngdùfēijīngxìzhīzàijiéjīng AT zhāngruìdá diànjiāngfǔzhùhuàxuéqìxiāngzhēngdùfēijīngxìzhīzàijiéjīng
_version_	1717764312481660928

Recrystallization of PECVD amorphous silicon films on SiO2 substrates

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