CHARACTERISTICS AND APPLICATIONS OF NEW SILOXANE SOG IN SUBMICRON PLANARIZATION TECHNOLOGY
碩士 === 國立交通大學 === 材料科學(工程)研究所 === 81 === When the line width of VLSI backend processes reduces to sub- half micron regime, a new siloxane-type SOG is demanded. In this work, AS314 from Allied Signal Inc. was investigated. Material character...
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| Format: | Others |
| Language: | en_US |
| Published: |
1993
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| Online Access: | http://ndltd.ncl.edu.tw/handle/86137133415895030039 |