The Structure Analysis of the Selectively Grown Si Epilayers
碩士 === 國立交通大學 === 電子研究所 === 81 === Low-temperature selective epitaxial growth (SEG ) of silicon sing dichlorosilane - hydrogen mixture in an LPCVD hot-wall reactor has been discussed with respect to the wafer preparation, the deposition tem...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1993
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| Online Access: | http://ndltd.ncl.edu.tw/handle/62442816874409037892 |