Low Temperature Synthsis of Diamond Films by Microwave Plasma Chemical Vapor Deposition
碩士 === 大同工學院 === 材料科學(工程)研究所 === 81 === This research employed the microwave plasma chemical vapor deposition method to synthesize diamond films under low temperature ( < 300 ℃ ). The diamond films were deposited on silicon wafers with a so...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1993
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/20699489530673555077 |