Material Characterization and Recrystallization of PECVD Amorphous SiGe:H Thin Film
碩士 === 國立交通大學 === 電子研究所 === 82 === With plane-view transmission electron microscope(TEM) inves- tigation，the crystalline orientation and lattice constantrecrystallized amorphous SiGe:H film are determined. The results of relationship be...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1994
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/81065736497577688550 |