Formation of the Shallow Junctions by the Implantation-Through- Polysilicon Technique
碩士 === 國立交通大學 === 電子研究所 === 82 === As the device geometries are continuously scaling down,the abrication and control of shallow junctions become increas- ingly difficult. Implantation through polysilicon (ITP) is onethe effective approaches...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1994
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/36444851330329203064 |