Deposition of Titanium Silicide Films from Difluorosilylene and Titanium Tetrachloride
博士 === 國立清華大學 === 化學學系 === 82 === A new method for depositing thin films of titanium silicide by using difluorosilylene and titanium tetrachloride as precursors of chemical vapour deposition has been developed. When the partial pressures of TiCl4 and (SiF...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1994
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85096952851656574019 |