Preparation and Characteristic of AlN Thin Film by RF Magnetron Sputtering

碩士 === 國立成功大學 === 材料科學(工程)研究所 === 83 === The RF magnetron sputtering technique was employed in this study to obtain AlN thin films on silicon and glass substrat- es. The reaction atmosphere was a mixture of argon and nitr- ogen and the sel...

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Bibliographic Details
Main Authors: Po-Fu Yen, 顏伯甫
Other Authors: Nan-Chung Wu
Format: Others
Language:zh-TW
Published: 1995
Online Access:http://ndltd.ncl.edu.tw/handle/89860094719100628610